Etching solution compositions for metal laminate films
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United States of America Patent
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May 26, 2015
Grant Date -
Dec 8, 2011
app pub date -
Feb 23, 2010
filing date -
Feb 23, 2009
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Abstract
Disclosed are etching solution compositions that comprise fluorine compounds and iron ions, which are used for bulk etching of metal laminate films wherein a layer comprising aluminum or an aluminum alloy is laminated on top and a layer comprising titanium or a titanium alloy on bottom, and an etching method using said etching solution compositions.
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