Tool configuration and method for extreme ultra-violet (EUV) patterning with a deformable reflective surface
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 19, 2015
Grant Date -
Apr 16, 2015
app pub date -
Oct 11, 2013
filing date -
Oct 11, 2013
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Some embodiments of the present disclosure relate to a tool configuration and method for EUV patterning with a deformable reflective surface comprising a mirror or reticle. A radiation source provides EUV radiation which is reflected off the deformable reflective surface to transfer a reticle pattern to a semiconductor workpiece. A metrology tool measures a residual vector formed between a first shape of the semiconductor workpiece and a second shape of the reticle pattern. And, a topology of the deformable reflective surface is changed based upon the residual vector to minimize a total magnitude of the residual vector.
First Claim
Other Claims data not available
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- H01L Class
- 0 % this patent is cited more than
- 10 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Nov 19, 2026 |
