Plasma etching of diamond surfaces
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United States of America Patent
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May 19, 2015
Issued Date -
N/A
app pub date -
Jan 22, 2008
filing date -
Jan 22, 2007
priority date (Note) -
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Abstract
The present invention relates to a method of producing a diamond surface including the steps of providing an original diamond surface, subjecting the original diamond surface to plasma etching to remove at least 2 nm of material from the original surface and produce a plasma etched surface, the roughness Rq of the plasma etched surface at the location of the etched surface where the greatest depth of material has been removed satisfying at least one of the following conditions: Rq of the plasma etched surface is less than 1.5 times the roughness of Rq of the original surface, or Rq of the plasma etched surface is less than 1 nm.
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International Classification(s)
- C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....
- C03C:CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREO....
- H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
- G01N:INVESTIGATING OR ANALYSING MATERIALS BY DETERMININ....
- C23F:NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM S....
- C30B:SINGLE-CRYSTAL GROWTH
- B44C:PRODUCING DECORATIVE EFFECTS
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