Cleaning compositions for use in closed loop cleaning machines
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United States of America Patent
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May 19, 2015
Grant Date -
Apr 21, 2011
app pub date -
Feb 27, 2009
filing date -
Apr 9, 2008
priority date (Note) -
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Abstract
Embodiments of the present disclosure include cleaning processes, closed loop cleaning machines, and methods of cleaning an article. The cleaning process includes contacting a surface of an article with a cleaning composition in a cleaning chamber, where the cleaning composition includes at least about 85 percent by weight organic solvents, based on total weight of the cleaning composition, and where at least about 5 percent by weight of the organic solvents is propylene glycol, based on total weight of the organic solvents, to clean the surface of the article, collecting the cleaning composition including contaminants, and recovering the cleaning composition via distillation, where a distillation apparatus removes the contaminants from the cleaning composition and is connected to the cleaning chamber by a process stream.
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