Patterning of ionic polymers
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United States of America Patent
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May 5, 2015
Grant Date -
Sep 16, 2010
app pub date -
Oct 18, 2007
filing date -
Oct 19, 2006
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Abstract
In one aspect, methods of patterning of thin films of an ionotropic polymer (e.g., poly(acrylic acid)) are provided. These processes can create micron or sub-micron-scale patterns of ionotropic polymers such as cation crosslinked poly(acrylic acid) (CCL-PAA). In one embodiment, patterning may be performed within microfluidic channels by flowing a solution of crosslinking agent (e.g., metal cations such as Ag+, Ca2+, Pd2+, Al3+, La3+, and Ti4+) that can crosslink a portion of an ionotropic polymer in contact with the solution. In another embodiment, methods of patterning ionotropic polymers involve photolithography. Upon patterning a positive photoresist (e.g., diazonaphthoquinone-novolac resin) on a film of CCL-PAA, the exposed regions of CCL-PAA can be etched by an aqueous solution. Advantageously, the patterned, crosslinked polymer may also serve as both a reactant and a matrix for subsequent chemistry. For example, in some embodiments, the initial crosslinking cation can be exchanged for a second cation that could not be patterned photolithographically. Patterned films of CCL-PAA can also be used to host and template the reduction of metallic cations to metallic nanoparticles, and to fabricate porous, low-k dielectric substrates.

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Patent Owner(s)
Patent Owner | Address | |
---|---|---|
PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 17 QUINCY STREET CAMBRIDGE MA 02138 |
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Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Lahav, Michal | Rehovot, IL | 11 | 28 |
Narovlyansky, Max | Cambridge, US | 7 | 84 |
Perez-Castillejos, Raquel | Cambridge, US | 2 | 73 |
Rodriguez, Leonard N J | Cambridge, US | 1 | 0 |
Weiss, Emily A | Cambridge, US | 8 | 22 |
Whitesides, George M | Newton, US | 241 | 11388 |
Winkleman, Adam | Brookline, US | 11 | 180 |
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