Patterning of ionic polymers

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United States of America Patent

PATENT NO 9023458
APP PUB NO 20100233434A1
SERIAL NO

12311811

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Abstract

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In one aspect, methods of patterning of thin films of an ionotropic polymer (e.g., poly(acrylic acid)) are provided. These processes can create micron or sub-micron-scale patterns of ionotropic polymers such as cation crosslinked poly(acrylic acid) (CCL-PAA). In one embodiment, patterning may be performed within microfluidic channels by flowing a solution of crosslinking agent (e.g., metal cations such as Ag+, Ca2+, Pd2+, Al3+, La3+, and Ti4+) that can crosslink a portion of an ionotropic polymer in contact with the solution. In another embodiment, methods of patterning ionotropic polymers involve photolithography. Upon patterning a positive photoresist (e.g., diazonaphthoquinone-novolac resin) on a film of CCL-PAA, the exposed regions of CCL-PAA can be etched by an aqueous solution. Advantageously, the patterned, crosslinked polymer may also serve as both a reactant and a matrix for subsequent chemistry. For example, in some embodiments, the initial crosslinking cation can be exchanged for a second cation that could not be patterned photolithographically. Patterned films of CCL-PAA can also be used to host and template the reduction of metallic cations to metallic nanoparticles, and to fabricate porous, low-k dielectric substrates.

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Patent Owner(s)

Patent OwnerAddress
PRESIDENT AND FELLOWS OF HARVARD COLLEGE17 QUINCY STREET CAMBRIDGE MA 02138

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lahav, Michal Rehovot, IL 11 28
Narovlyansky, Max Cambridge, US 7 84
Perez-Castillejos, Raquel Cambridge, US 2 73
Rodriguez, Leonard N J Cambridge, US 1 0
Weiss, Emily A Cambridge, US 8 22
Whitesides, George M Newton, US 241 11388
Winkleman, Adam Brookline, US 11 180

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