Environmental control subsystem for a variable data lithographic apparatus
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United States of America Patent
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May 5, 2015
Grant Date -
Feb 7, 2013
app pub date -
Aug 5, 2011
filing date -
Apr 27, 2011
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Abstract
Methods and structures are disclosed to minimize the presence of vapor clouding in the path between an energy (e.g., radiation) source and the dampening fluid layer in a variable data lithography system. Also disclosed are conditions for optimizing vaporization of regions of the dampening fluid layer for a given laser source power. Conditions are also disclosed for minimizing re-condensation of vaporized dampening fluid onto the patterned dampening fluid layer. Accordingly, a reduction in the power required for, and an increase in the reproducibility of, patterning of a dampening fluid layer over a reimageable surface in a variable data lithography system are disclosed.
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