Method for preparing a seam area for a PMC base fabric
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United States of America Patent
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Apr 21, 2015
Grant Date -
Mar 13, 2014
app pub date -
Sep 7, 2012
filing date -
Sep 7, 2012
priority date (Note) -
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Abstract
A process for preparing a seam area for a paper machine clothing (PMC) base fabric includes the steps of: forming the PMC base fabric by flat-weaving, the PMC base fabric including warp yarns extending in machine direction and weft yarns extending in cross machine direction and interwoven with the warp yarns, the weft yarns including first weft yarns and a second weft yarn, the second weft yarn being a multifilament yarn, the warp yarns, the first weft yarns, and the multifilament yarn being woven together on a loom in an original weaving process, the multifilament yarn being positioned in an anticipated seam area; and folding over the PMC base fabric, after weaving the multifilament yarn with the warp yarns, to form a seam loop of the PMC base fabric such that the multifilament yarn is a first one of the weft yarns on a sheet side of the seam loop.
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