Broadband techniques to reduce the effects of impedance mismatch in plasma chambers
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United States of America Patent
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Apr 21, 2015
Grant Date -
May 17, 2007
app pub date -
Nov 17, 2005
filing date -
Nov 17, 2005
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Abstract
A plasma generator system for reducing the effects of impedance mismatch. The system has a variable frequency source having an output for emitting an RF signal. A plasma chamber has an input for receiving the RF signal. The variable frequency source modulates at least one of the frequency and phase of the RF signal to improve the system tolerance of impedance mismatches between the output of the variable frequency source and the input of the plasma chamber.
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