Apparatus and method for printing a periodic pattern with a large depth of focus
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United States of America Patent
Stats
-
Apr 14, 2015
Grant Date -
Dec 26, 2013
app pub date -
Jul 30, 2013
filing date -
Jul 7, 2010
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An apparatus and a method for printing a desired pattern into a photosensitive layer. A mask bears a pattern of linear mask features parallel to a first direction. The layer is arranged parallel to and separated from the mask. Substantially monochromatic light is generated and the mask pattern is illuminated with the light over a range of angles of incidence in a plane parallel to the first direction, at substantially a single angle in an orthogonal plane of incidence and so that the light of each angle of incidence transmitted by the mask forms a light-field component at the layer. The integration of the components prints the desired pattern. The range of angles is selected so that the integration of the components is substantially equivalent to an average of the range of transversal intensity distributions formed between Talbot image planes by light at one of the angles of incidence.
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International Classification(s)
Cited Art Landscape
Patent Citation Ranking
- 3 Citation Count
- G03B Class
- 15.46 % this patent is cited more than
- 10 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Oct 14, 2026 |
