Method of fabricating composite field emission source

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United States of America Patent

PATENT NO 9005407
APP PUB NO 20120090986A1
SERIAL NO

13317955

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Abstract

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A method of fabricating a composite field emission source is provided. A first stage of film-forming process is performed by using RF magnetron sputtering, so as to form a nano structure film on a substrate, in which the nano structure film is a petal-shaped structure composed of a plurality of nano graphite walls. Afterward, a second stage of film-forming process is performed for increasing carbon accumulation amount on the nano structure film and thereby growing a plurality of nano coral-shaped structures on the petal-shaped structure. Therefore, the composite field emission source with high strength and nano coral-shaped structures can be obtained, whereby improving the effect and life of electric field emission.

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Patent Owner(s)

Patent OwnerAddress
TATUNG COMPANYNO 22 CHUNGSHAN N RD 3RD SEC TAIPEI 104

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jeng, Jian-Min Taipei, TW 11 23
Lo, Jyi-Tsong Taipei, TW 4 7
Shih, Wen-Ching Taipei, TW 11 45
Tasi, Wei-Lung Taipei, TW 2 6

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