Methods for formation of substrate elements
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United States of America Patent
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Apr 7, 2015
Grant Date -
Sep 17, 2009
app pub date -
Dec 9, 2008
filing date -
Dec 14, 2007
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Abstract
The present invention relates to methods of forming substrate elements, including semiconductor elements such as nanowires, transistors and other structures, as well as the elements formed by such methods.
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