Insulator interposed type plasma processing apparatus

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Apr 7, 2015
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Jul 28, 2011
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Feb 10, 2010
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Mar 31, 2009

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Abstract

Electrically charged droplets and neutral droplets mixed with plasma are removed with better efficiency, and an improvement in the surface treatment precision of film formation by high purity plasma is sought.

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FERROTEC CORPORATION	TOKYO 104-0031

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Inventor Name	Address	# of filed Patents	Total Citations
Shiina, Yuichi	Chuo-ku, JP	10	44

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Insulator interposed type plasma processing apparatus

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United States of America Patent

13122392

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PATENT NO	8999122
APP PUB NO	20110180403A1
SERIAL NO	13122392
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
April 07, 2015	US,8999122,B2 US8999122B2	GRANTED PATENT AS SECOND PUBLICATION
July 28, 2011	US,20110180403,A1 US20110180403A1	FIRST PUBLISHED PATENT APPLICATION

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13122392

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