Apparatus and method utilizing forced convection for uniform thermal treatment of thin film devices
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United States of America Patent
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Apr 7, 2015
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Sep 20, 2012
app pub date -
Jan 4, 2012
filing date -
Jan 14, 2011
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Abstract
An apparatus for uniform reactive thermal treatment of thin-film materials includes a chamber enclosing a tube shaped space filled with a work gas and heaters disposed outside the chamber. The apparatus further includes a loading configuration for subjecting a plurality of planar substrates to the work gas in the tube shaped space. Baffles are disposed above and below the loading configuration.
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