Method for coating a substrate in a vacuum chamber having a rotating magnetron
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United States of America Patent
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Mar 31, 2015
Grant Date -
May 31, 2012
app pub date -
Jun 28, 2010
filing date -
Jun 26, 2009
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Abstract
In a method for coating a substrate in a vacuum chamber having a rotating magnetron, wherein a substrate is guided past the magnetron in a substrate transport direction and is coated by a material, which has been isolated from a target connected to the magnetron, and, optionally with the material reacting with a reactive gas present in the vacuum chamber, homogeneity of the coating layer on a substrate is improved by stabilizing the working point by way of the target rotation. This is achieved in that a periodic change of a first process parameter caused by the target revolution is compensated for by a periodic change of a second process parameter having a determined level and/or by employing two magnetrons having different rotational speeds.
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