Plasma processing apparatus
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United States of America Patent
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Mar 24, 2015
Grant Date -
Aug 28, 2014
app pub date -
Jun 20, 2013
filing date -
Aug 15, 2012
priority date (Note) -
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Abstract
The present invention provides a plasma processing apparatus capable of bringing plasma close to a processing target and separating the plasma from the processing target. The plasma processing apparatus 1 according to the present invention has a chamber internally having a holding space 2a in which a processing target object 5 is held, and a plasma space 2b in which plasma is to be formed, a plasma gun 3 for emitting electrons into the plasma space 2b to form the plasma, and at least one pair of position-adjustable opposed magnets 4 for forming a magnetic flux passing across the chamber 2, between the holding space 2a and the plasma space 2b.
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