System and method for measuring X-ray beam profile using an area detector
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United States of America Patent
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Mar 17, 2015
Grant Date -
Jan 19, 2012
app pub date -
Mar 23, 2011
filing date -
Jul 16, 2010
priority date (Note) -
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Abstract
The claimed subject matter describes a novel technique to measure the beam profile using an area detector. In one embodiment, a set of one-dimensional beam profile measurements is performed by taking two images under the same source conditions but at two different positions of the detector, with each position of the detector shifted by a certain distance in the direction corresponding to the direction of the one-dimensional profile measurement. In further embodiments, a set of two-dimensional beam profile measurements is achieved by determining a second set of one-dimensional profiles from the same sampling points in a second direction and building a two-dimensional map of the beam profile by correlating the first one-dimensional profile measurement with the second one-dimensional profile measurement.
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International Classification(s)
- H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
- G21K:TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNET....
- G01N:INVESTIGATING OR ANALYSING MATERIALS BY DETERMININ....
- A61B:DIAGNOSIS; SURGERY; IDENTIFICATION
- G12B:DETAILS OF INSTRUMENTS, OR COMPARABLE DETAILS OF O....
- H05G:X-RAY TECHNIQUE
- A61N:ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY;....
- G01D:MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VAR....
- G01T:MEASUREMENT OF NUCLEAR OR X-RADIATION
- G06K:RECOGNITION OF DATA; PRESENTATION OF DATA; RECORD ....
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