Photoresist composition, method of forming a pattern using the same, and method of manufacturing a display substrate
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United States of America Patent
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Mar 3, 2015
Grant Date -
Feb 14, 2013
app pub date -
Aug 2, 2012
filing date -
Aug 11, 2011
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Abstract
A photoresist composition, a method of forming a pattern using the photoresist composition, and a method of manufacturing a display substrate are disclosed. A photoresist composition includes an alkali-soluble resin, a quinone diazide-based compound, a multivalent phenol-based compound, and a solvent. Therefore, photosensitivity for light having a wavelength in a range of about 392 nm to about 417 nm may be improved, and reliability of forming a photo pattern and a thin film pattern using the photoresist composition may be improved.
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