Tunnel field effect transistor

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United States of America Patent

PATENT NO 8963219
APP PUB NO 20120086058A1
SERIAL NO

13270898

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Abstract

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A tunnel field effect transistor and a method of making the same. The transistor includes a semiconductor substrate. The transistor also includes a gate located on a major surface of the substrate. The transistor further includes a drain of a first conductivity type. The transistor also includes a source of a second conductivity type extending beneath the gate. The source is separated from the gate by a channel region and a gate dielectric. The transistor is operable to allow charge carrier tunnelling from an inversion layer through an upper surface of the source.

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Patent Owner(s)

Patent OwnerAddress
VLSI TECHNOLOGY LLC1209 ORANGE STREET WILMINGTON DE 19801

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Boccardi, Guillaume Woluwe-Saint-Lambert, BE 11 51
Curatola, Gilberto Korbek-lo, BE 70 1232
Donkers, Johannes Josephus Theodorus Marinus Valkenswaard, NL 44 111
Golubovic, Dusan Leuven, BE 13 98
Mertens, Hans Leuven, BE 28 73

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