Multilayer substrate structure and method of manufacturing the same

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United States of America Patent

PATENT NO 8956952
APP PUB NO 20130334568A1
SERIAL NO

13794327

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Abstract

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A multilayer substrate structure comprises a substrate, a thermal matching layer formed on the substrate and a lattice matching layer above the thermal matching layer. The thermal matching layer includes at least one of molybdenum, molybdenum-copper, mullite, sapphire, graphite, aluminum-oxynitrides, silicon, silicon carbide, zinc oxides, and rare earth oxides. The lattice matching layer includes a first chemical element and a second chemical element to form an alloy. The first and second chemical element has similar crystal structures and chemical properties. The coefficient of thermal expansion of the thermal matching layer and the lattice parameter of the lattice matching layer are both approximately equal to that of a member of group III-V compound semiconductors. The lattice constant of the lattice matching layer is approximately equal to that of a member of group III-V compound semiconductor.

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Patent Owner(s)

Patent OwnerAddress
TIVRA CORPORATION3343 B VINCENT ROAD PLEASANT HILL CA 94602

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
De, Indranil Mountain View, US 120 1081
Machuca, Francisco Oakland, US 18 59

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