System and apparatus to facilitate physical vapor deposition to modify non-metal films on semiconductor substrates
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United States of America Patent
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Feb 17, 2015
Grant Date -
Mar 3, 2011
app pub date -
Aug 31, 2009
filing date -
Aug 31, 2009
priority date (Note) -
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Abstract
Embodiments of the invention relate generally to semiconductor device fabrication and processes, and more particularly, to an apparatus and a system for implementing arrangements of magnetic field generators configured to facilitate physical vapor deposition (“PVD”) and/or controlling impedance matching associated with a non-metal-based plasma used to modify a non-metal film, such as a chalcogenide-based film.
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|---|---|---|---|---|
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Aug 17, 2026 |
