Method for depositing high aspect ratio molecular structures
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United States of America Patent
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Feb 10, 2015
Grant Date -
Dec 10, 2009
app pub date -
Mar 7, 2007
filing date -
Mar 8, 2006
priority date (Note) -
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status (Latency Note)
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Abstract
A method for depositing high aspect ratio molecular structures (HARMS), which method comprises applying a force upon an aerosol comprising one or more HARM-structures, which force moves one or more HARM-structures based on one or more physical features and/or properties towards one or more predetermined locations for depositing one or more HARM-structures in a pattern by means of an applied force.
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International Classification(s)
- 2007 Application Filing Year
- C01B Class
- 805 Applications Filed
- 421 Patents Issued To-Date
- 52.30 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- C01B Class
- 0 % this patent is cited more than
- 10 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Aug 10, 2026 |
