Evaporative systems and methods for dampening fluid control in a digital lithographic system
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United States of America Patent
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Feb 10, 2015
Grant Date -
Sep 26, 2013
app pub date -
Mar 21, 2012
filing date -
Mar 21, 2012
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Abstract
A system and corresponding methods are disclosed for controlling the thickness of a layer of dampening fluid applied to a reimageable surface of an imaging member in a variable data lithography system. Following deposition of the dampening fluid layer, a gas is passed over a region of the fluid layer prior to pattern forming. The gas causes a controlled amount of the dampening fluid layer to evaporate such that the remaining layer is of a desired and controlled thickness. Among other advantages, improved print quality is obtained.
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