Testing apparatus using charged particles and device manufacturing method using the testing apparatus

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United States of America Patent

PATENT NO 8946631
SERIAL NO

14156140

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Abstract

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A substrate is irradiated by primary electrons and secondary electrons generated from the substrate are detected by a detector. A reference die is placed on the stage to obtain a pattern matching template image including feature coordinates of the reference die. A pattern matching is performed with an arbitrary die in a row or column including the reference die using the template image to obtain feature coordinates of the arbitrary die. An angle of misalignment is calculated between the direction of the row or column including the reference die and one of the directions of movement of the substrate on the basis of the feature coordinates of the arbitrary die and those of the reference die. The stage is rotated to correct the angle of misalignment to conform the direction of the row or column including the reference die with the one of the directions of movement of the substrate.

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Patent Owner(s)

Patent OwnerAddress
EBARA CORPORATIONTOKYO 144-8510

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hatakeyama, Masahiro Kanagawa-ken, JP 112 2190
Karimata, Tsutomu Kanagawa-ken, JP 68 1953
Kimba, Toshifumi Kanagawa-ken, JP 91 1870
Murakami, Takeshi Tokyo, JP 273 5723
Noji, Nobuharu Kanagawa-ken, JP 107 2712
Satake, Tohru Kanagawa-ken, JP 99 2461
Sobukawa, Hirosi Kanagawa-ken, JP 54 1854
Suematsu, Kenichi Kanagawa-ken, JP 17 480
Tabe, Yutaka Kanagawa-ken, JP 8 411
Tajima, Ryo Kanagawa-ken, JP 20 455
Tohyama, Keiichi Kanagawa-ken, JP 10 534
Watanabe, Kenji Kanagawa-ken, JP 546 8684
Yoshikawa, Shoji Tokyo, JP 90 2421

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