Process for forming silver films on silicon

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United States of America Patent

PATENT NO 8945794
APP PUB NO 20120156585A1
SERIAL NO

13373484

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Abstract

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A process is provided for etching a silicon-containing substrate. In the process, the surface of the substrate is cleaned. A film of alumina is deposited on the cleaned substrate surface. A silver film is deposited above the film of alumina. An etchant comprising HF is contacted with the silver film.

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Patent Owner(s)

Patent OwnerAddress
ADVANCED SILICON GROUP INC173 BEDFORD ROAD LINCOLN MA 01773

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Black, Marcie Woburn, US 1 2
Buchine, Brent A Watertown, US 26 218
Jura, Mike Woburn, US 5 22
Miller, Jeff Woburn, US 91 2264
Modawar, Faris Woburn, US 22 165
Murphy, Brian Woburn, US 202 6619

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