Methods to fabricate non-metal films on semiconductor substrates using physical vapor deposition
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United States of America Patent
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Jan 20, 2015
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Mar 3, 2011
app pub date -
Aug 31, 2009
filing date -
Aug 31, 2009
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Abstract
Embodiments of the invention relate generally to semiconductor device fabrication and processes, and more particularly, to methods for implementing arrangements of magnetic field generators configured to facilitate physical vapor deposition (“PVD”) and/or for controlling impedance matching associated with a non-metal-based plasma used to modify a non-metal film, such as a chalcogenide-based film.
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