Projection exposure apparatus with optimized adjustment possibility
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United States of America Patent
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May 31, 2016
Grant Date -
Jul 26, 2012
app pub date -
Mar 22, 2012
filing date -
Mar 22, 2012
priority date (Note) -
Withdrawn
status (Latency Note)
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Abstract
A microlithography projection objective includes an optical element, a manipulator configured to manipulate the optical element, and a control unit configured to control the manipulator. The control unit includes a first device configured to control movement of the manipulator, a memory comprising an upper bound for a range of movement of the manipulator, and a second device configured to generate a merit function based on a square of a root mean square (RMS) of at least one error and configured to minimize the merit function subordinate to the upper bound for the range of movement of the manipulator.
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