System for attachment of an electrode into an inductively coupled plasma source
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United States of America Patent
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Jan 6, 2015
Grant Date -
May 30, 2013
app pub date -
Nov 30, 2011
filing date -
Nov 30, 2011
priority date (Note) -
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Abstract
An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.
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