Alignment marks in substrate having through-substrate via (TSV)

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United States of America Patent

PATENT NO 8928159
SERIAL NO

12874952

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Abstract

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A device includes a substrate, and an alignment mark including a conductive through-substrate via (TSV) penetrating through the substrate.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTDNO 8 LI-HSIN ROAD 6 HSINCHU SCIENCE PARK HSINCHU 300

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Hsin Hsin-Chu, TW 12 475
Chiou, Wen-Chih Miaoli, TW 414 9438
Jeng, Shin-Puu Hsin-Chu, TW 851 18082
Lin, Jing-Cheng Hsin-Chu, TW 575 17188
Tsai, Fang Wen Hsin-Chu, TW 24 869

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