Closed chamber for wafer wet processing
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United States of America Patent
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Jan 6, 2015
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N/A
app pub date -
Oct 27, 2010
filing date -
Oct 27, 2010
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Abstract
An improved design for a closed chamber process module for single wafer wet processing utilizes a combination lid and gas showerhead for sealing the chamber from above. One or more media arms dispense liquid onto a wafer in the chamber. The media arms are mounted inside the chamber but are connected by a linkage that passes through the chamber wall to a drive unit mounted outside the chamber.
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