Dual hexagonal shaped plasma source
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United States of America Patent
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Dec 16, 2014
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N/A
app pub date -
Apr 22, 2013
filing date -
Jul 14, 2006
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Abstract
A plasma source includes a hexagonal hollow cathode, the cathode including six targets and six magnets to generate and maintain a high density plasma; and an anode located beneath the cathode. A second hexagonal hollow cathode can be positioned concentric to the hexagonal hollow cahode.
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