Press-fitting method of member and press-fitting apparatus
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United States of America Patent
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Dec 16, 2014
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N/A
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Dec 24, 2008
filing date -
Dec 25, 2007
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Abstract
The invention provides a press-fitting method of a member and a press-fitting apparatus in which press-fitting errors can be reduced, without using a dummy pin.
First Claim
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- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
JTEKT CORPORATION | 1-1 ASAHI-MACHI KARIYA-SHI AICHI-KEN 448-8652 |
International Classification(s)

- 2008 Application Filing Year
- B23P Class
- 1751 Applications Filed
- 419 Patents Issued To-Date
- 23.93 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Fuse, Masaru | Kashihara, JP | 95 | 1155 |
# of filed Patents : 95 Total Citations : 1155 |
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Patent Citation Ranking
- 3 Citation Count
- B23P Class
- 18.99 % this patent is cited more than
- 11 Age
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Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
---|---|---|---|---|
11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Jun 16, 2026 |
Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
Full Text
US Patent No: 8681427
System and method for separating a main pulse and a pre-pulse beam from a laser source
Abstract
A dichroic beam splitter module is disclosed for separating a main pulse laser beam from a pre-pulse laser beam each traversing a common beam path. In one embodiment, two dichroic elements are physically aligned along the beam path and are configured to pass the pre-pulse, a laser light having a first wavelength, to target material located near an irradiation site yet reflect the main pulse, a laser light having a second wavelength. The reflected main pulse is then further reflected by two reflective elements or mirrors from the first dichroic element to the second dichroic element and then on to the irradiation site. In alternative embodiments, the first mirror is deformable to alter beam characteristics of the reflected main pulse beam and the second mirror is adjustable to align the main pulse beam to the irradiation site.
Description
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Jan 29, 2024 | AS | ASSIGNMENT | free format text: CHANGE OF NAME;ASSIGNOR:TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING AG;REEL/FRAME:070014/0571 Owner name: TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING SE, GERMANY Effective Date: Jun 24, 2024 free format text: CHANGE OF NAME;ASSIGNOR:TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING GMBH;REEL/FRAME:070015/0125 Owner name: TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING AG, GERMANY Effective Date: Jan 29, 2024 |
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Nov 27, 2014 | AS | ASSIGNMENT | free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:LAMBERT, MARTIN;REEL/FRAME:036495/0896 Owner name: TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURIN Effective Date: Nov 27, 2014 |
May 27, 2014 | CC | CERTIFICATE OF CORRECTION | |
Mar 25, 2014 | I | Issuance | |
Mar 05, 2014 | STCF | INFORMATION ON STATUS: PATENT GRANT | free format text: PATENTED CASE |
Jan 06, 2014 | AS | ASSIGNMENT | free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:CYMER, LLC;REEL/FRAME:032911/0555 Owner name: ASML NETHERLANDS B.V., NETHERLANDS Effective Date: Jan 06, 2014 |
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May 30, 2013 | AS | ASSIGNMENT | free format text: MERGER;ASSIGNOR:CYMER, INC.;REEL/FRAME:032445/0511 Owner name: CYMER, LLC, CALIFORNIA Effective Date: May 30, 2013 |
Jul 11, 2012 | AS | ASSIGNMENT | free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:BERGSTEDT, ROBERT A.;PATE, CHRISTOPHER PAUL;ARCAND, JASON MICHAEL;SIGNING DATES FROM 20120706 TO 20120709;REEL/FRAME:028532/0392 Owner name: CYMER, INC., CALIFORNIA |
Jun 27, 2012 | F | Filing | |
May 31, 2012 | PD | Priority Date |

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