Method and apparatus for printing high-resolution two-dimensional periodic patterns
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United States of America Patent
Stats
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Dec 2, 2014
Issued Date -
N/A
app pub date -
Nov 16, 2011
filing date -
Nov 16, 2010
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A method for printing a periodic pattern having a first symmetry and a first period into a photosensitive layer. The method includes providing a mask bearing a pattern of at least two overlapping sub-patterns which have a second symmetry and a second period, the features of each sub-pattern being formed in a transmissive material, providing a substrate bearing the layer, arranging the mask with a separation from the substrate, providing light having a central wavelength for illuminating the mask to generate a light-field in which light of the central wavelength forms a range of intensity distributions between Talbot planes, illuminating said mask pattern with said light while maintaining the separation or changing it by a distance whereby the photosensitive layer is exposed to an average of the range of intensity distributions, wherein the light transmitted by each sub-pattern is shifted in phase relative to that transmitted by another sub-pattern.
First Claim
Other Claims data not available
Family
| Country | kind | publication No. | Filing Date |
|---|---|---|---|
| JP | B2 | JP5901643 | Nov 16, 2011 |
| KR | B1 | KR101755758 | Nov 16, 2011 |
| WO | A2 | WO2012066489 | Nov 16, 2011 |
| EP | B1 | EP2641130 | Nov 16, 2011 |
| CN | B | CN103370654 | Nov 16, 2011 |
International Classification(s)
- 2011 Application Filing Year
- G06F Class
- 41019 Applications Filed
- 32743 Patents Issued To-Date
- 79.83 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 4 Citation Count
- G06F Class
- 4.02 % this patent is cited more than
- 11 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Jun 2, 2026 |
