Plasma-arc vaporization chamber with wide bore
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United States of America Patent
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Nov 25, 2014
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N/A
app pub date -
May 8, 2008
filing date -
May 11, 2007
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Abstract
A plasma-arc vaporization chamber includes features configured to permit very high-energy plasmas, preferably with high hydrogen content. The vaporization chamber includes a female electrode having an internal chamber with a target region made of a conductive material highly resistant to thermal degradation and an isthmus region of sufficient width to slow plasma flow therethrough enough to permit vaporization within the internal chamber of a material delivered into the plasma. The material is preferably injected at an angle counter to the flow of the plasma. The vaporization chamber also includes a flange-cooling chamber adjacent to a flange of the female electrode. Additionally, the chamber preferably includes vortexing gas injectors configured to provide a helical gas flow within at least a portion of the internal chamber.
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