Structure and method for single gate non-volatile memory device having a capacitor well doping design with improved coupling efficiency

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United States of America Patent

PATENT NO 8890225
SERIAL NO

13273505

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Abstract

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The NVM device includes a semiconductor substrate having a first region and a second region. The NVM device includes a data-storing structure formed in the first region and designed operable to retain charges. The NVM device includes a capacitor formed in the second region and coupled with the data-storing structure for data operations. The data-storing structure includes a first doped well of a first-type in the semiconductor substrate. The data-storing structure includes a first gate dielectric feature on the first doped well. The data-storing structure includes a first gate electrode disposed on the first gate dielectric feature and configured to be floating. The capacitor includes a second doped well of the first-type. The capacitor includes a second gate dielectric feature on the second doped well. The capacitor also includes a second gate electrode disposed on the second gate dielectric feature and connected to the first gate electrode.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTDNO 8 LI-HSIN ROAD 6 HSINCHU SCIENCE PARK HSINCHU 300

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Shih-Hsien Hsinchu, TW 43 157
Ko, Chun-Yao Hsinchu, TW 40 149
Kuo, Liang-Tai Zhudong Township, Hsinchu County, TW 17 55
Liao, Ta-Chuan Taichung, TW 15 158
Tsui, Ying-Kit Cupertino, US 5 84
Yang, Chien-Kao Taipei, TW 1 1

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