High frequency deflection measurement of IR absorption

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United States of America Patent

PATENT NO 8869602
SERIAL NO

13307464

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Abstract

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An AFM based technique has been demonstrated for performing highly localized IR spectroscopy on a sample surface by using the AFM probe to detect wavelength dependent IR radiation interaction, typically absorption with the sample in the region of the tip. The tip may be configured to produce electric field enhancement when illuminated by a radiation source. This enhancement allows for significantly reduced illumination power levels resulting in improved spatial resolution by confining the sample-radiation interaction to the region of field enhancement which is highly localized to the tip.

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Patent Owner(s)

Patent OwnerAddress
BRUKER NANO INC112 ROBIN HILL ROAD SANTA BARBARA CA 93117

International Classification(s)

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  • 2011 Application Filing Year
  • G01Q Class
  • 74 Applications Filed
  • 56 Patents Issued To-Date
  • 75.68 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances201120122013201420152016201720180255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Belkin, Mikhail Austin, US 10 112
Kjoller, Kevin Santa Barbara, US 30 523
Lu, Feng Austin, US 265 1220
Prater, Craig Santa Barbara, US 67 1053
Raschke, Markus Boulder, US 1 15
Yakolev, Vladislav V College Station, US 1 15

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  • 15 Citation Count
  • G01Q Class
  • 0 % this patent is cited more than
  • 11 Age
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