Method and sputter-deposition system for depositing a layer composed of a mixture of materials and having a predetermined refractive index
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United States of America Patent
Stats
-
Oct 21, 2014
Grant Date -
Sep 18, 2008
app pub date -
Mar 4, 2008
filing date -
Mar 13, 2007
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method and sputter-deposition system for depositing a layer composed of a mixture of materials and having a predetermined refractive index are provided. The sputter-deposition system includes a plurality of target cathodes, each of which comprises a target material having a different composition, that are powered by a single DC power supply. The plurality of target cathodes are cosputtered to deposit a layer composed of a mixture of materials on a substrate. The composite refractive index of the layer is controlled by adjusting an operating parameter of the plurality of target cathodes. Suitable operating parameters include cathode power, cathode voltage, cathode current, an angle between a cathode support and the substrate, and a flow rate of a reactive gas.
First Claim
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Family
International Classification(s)
- 2008 Application Filing Year
- C23C Class
- 1299 Applications Filed
- 709 Patents Issued To-Date
- 54.59 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 1 Citation Count
- C23C Class
- 11.69 % this patent is cited more than
- 11 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Apr 21, 2026 |
