Lithographic apparatus and device manufacturing method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 8860922
APP PUB NO 20120120377A1
SERIAL NO

13356231

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Abstract

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Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH
CARL ZEISS SMT AGRUDOLF-EBER-STRASSE 2 OBERKOCHEN 73447

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gellrich, Bernhard Aalen, DE 68 512
Hoogendam, Christiaan Alexander Veldhoven, NL 205 9950
Loopstra, Erik Roelof Eindhoven, NL 325 13468
Streefkerk, Bob Tilburg, NL 201 10575
Wurmbrand, Andreas Aalen-Reichenbach, DE 25 193

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