Charged particle beam devices
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United States of America Patent
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Oct 14, 2014
Grant Date -
Apr 19, 2012
app pub date -
Oct 14, 2011
filing date -
Oct 14, 2010
priority date (Note) -
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Abstract
In a charged particle beam device, such as an electron microscope, a beam generating apparatus generates a focussed charged particle beam e− that is incident on a specimen in a specimen chamber which holds the specimen in a gaseous environment. A pressure limiting aperture provides partial gaseous isolation of the specimen chamber from the beam generating means, and is located in a lens of the latter. The device includes a conduit, such as an intermediate chamber in the lens, through which, in use, gas is supplied to set up a flow of gas from the region of the lens towards the specimen, thereby to prevent material released from the specimen from impinging on the pressure limiting aperture, to prevent contamination of the latter. The device can be used in a method of scanning a specimen with a charged particle beam, for example in a method of electron microscopy.
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