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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
HALDEX BRAKE CORPORATION	10930 NORTH POMONA AVENUE NORTH AMERICAN SALES DIVISION KANSAS CITY MO 64153

International Classification(s)

• B21K:MAKING FORGED OR PRESSED PRODUCTS, e.g. HORSE-SHOE....
• B23K:SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLA....
• B60T:VEHICLE BRAKE CONTROL SYSTEMS OR PARTS THEREOF; BR....
• F16B:DEVICES FOR FASTENING OR SECURING CONSTRUCTIONAL E....
• F16D:COUPLINGS FOR TRANSMITTING ROTATION
• B65D:CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR....
• B21D:WORKING OR PROCESSING OF SHEET METAL OR METAL TUBE....

• 2010 Application Filing Year
• B21K Class
• 192 Applications Filed
• 89 Patents Issued To-Date
• 46.36 % Issued To-Date

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Spencer, John Rolland	Excelsior Springs, US	1	0
# of filed Patents : 1 Total Citations : 0

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Patent Citation Ranking

• 0 Citation Count
• B21K Class

• 0 % this patent is cited more than
• 11 Age

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
11.5 Year Payment	$7400.00	$3700.00	$1850.00	Apr 7, 2026

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
October 07, 2014	US,8850663,B2   US8850663B2	GRANTED PATENT AS SECOND PUBLICATION
March 08, 2012	US,20120054990,A1   US20120054990A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent No: 9846761

Mask design based on sensitivities to changes in pattern spacing

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Abstract

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A layout of an integrated circuit design is provided and a plurality of multiple patterning decompositions is determined from the layout. Each decomposition of the plurality of multiple patterning decompositions includes patterns separated into masks. One or more files are generated that include sensitivities of pattern capacitances to changes in spacing between patterns due to mask shifts. Using the sensitivities and changes in spacing, respective worst-case performance values are determined for each decomposition. A mask set is selected based on the worst-case performance values.

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Description

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Claims

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Claims data not available

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Legal Events

 

• MAFP2021
• I2017
• STCF2017
• P2017
• F2016
• AS2014

Date	Code	Event	Description
Jun 02, 2021	MAFP	MAINTENANCE FEE PAYMENT	free format text: PAYMENT OF MAINTENANCE FEE, 4TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1551); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY year of fee payment: 4
Dec 19, 2017	I	Issuance
Nov 29, 2017	STCF	INFORMATION ON STATUS: PATENT GRANT	free format text: PATENTED CASE
Jan 05, 2017	P	Published
Sep 15, 2016	F	Filing
Feb 10, 2014	AS	ASSIGNMENT	free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:CHOU, CHIH-CHENG;LIU, TE-YU;SU, KE-YING;AND OTHERS;REEL/FRAME:039758/0885 Owner name: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Effective Date: Feb 10, 2014