Tools and methods for forming semi-transparent patterning masks
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United States of America Patent
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Sep 30, 2014
Grant Date -
May 24, 2012
app pub date -
Nov 22, 2011
filing date -
Nov 22, 2010
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Abstract
Means, apparatus, systems, and/or methods are described for forming improved rigid or flexible semi-transparent imprinting templates. These templates can be used to produce patterning masks having improved resolution that do not require plasma etching for residue removal. The methods and apparatus are compatible with roll-to-roll manufacturing processes and enable roll-to-roll formation of a wide range of metal patterned films.
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