Optical waveguide fabrication
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United States of America Patent
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Sep 30, 2014
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Apr 26, 2011
filing date -
Apr 27, 2010
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Abstract
An optical device including an active core layer of silica glass doped with ions which serve as optical emitters, the active core layer being on a silica glass substrate and having a layer thickness of at least 5 μm, and wherein the layer is sintered at a temperature range of 1500-1600 C. and subsequently heat treated by a laser.
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