System and a method for generating periodic and/or quasi-periodic pattern on a sample
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United States of America Patent
Stats
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Sep 23, 2014
Grant Date -
Aug 7, 2008
app pub date -
Oct 13, 2005
filing date -
Oct 22, 2004
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A system for generating periodic or quasi-periodic patterns on a sample by means of an interference lithography technique includes a photon source, a mask and a sample holder. The mask has a grating for generating a predetermined pattern, wherein the mask is positioned at a first distance from the photon source. The sample holder is disposed at a second distance from the mask on a side facing away from the photon source. The second distance is selected to be where an intensity distribution is substantially stationary and distance-invariant, or the second distance is varied to obtain a desired average intensity distribution on the sample surface.
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Cited Art Landscape
Patent Citation Ranking
- 3 Citation Count
- G03B Class
- 13.66 % this patent is cited more than
- 11 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Mar 23, 2026 |
