Nitride-based light emitting device with excellent light emitting efficiency using strain buffer layer
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United States of America Patent
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Aug 26, 2014
Grant Date -
Jul 4, 2013
app pub date -
Dec 26, 2012
filing date -
Dec 30, 2011
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Abstract
The nitride-based light emitting device according to one embodiment includes a first nitride semiconductor layer doped with a first conductive impurity; a strain buffer layer formed on the first nitride semiconductor layer and comprised of InGaN; an active layer formed on the strain buffer layer and having a multi-quantum well structure in which a quantum-well layer and a quantum-barrier layer are alternately stacked one above another; and a second nitride semiconductor layer formed on the active layer and doped with a second conductive impurity opposite to the first conductive impurity, wherein the ratio B/A satisfies 1.4
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Patent Owner Address BOE HC SEMITEK LIMITED (HENGQIN) OFFICE 1501 NO 58 HUAJIN STREET HENGQIN NEW DISTRICT ZHUHAI CITY 519031 International Classification(s)
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# of filed Patents
Total Citations
Lee, Sung-Hak
Incheon, KR
16
101
Park, Jung-Won
Yongin-si, KR
16
297
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