Apparatus and method for producing carbon film using plasma CVD and carbon film

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United States of America Patent

PATENT NO 8808856
APP PUB NO 20070104867A1
SERIAL NO

10558874

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Abstract

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Provided is a method for uniformly producing a carbon film at a low cost with low power consumption. The method for producing a carbon film, including: a step of disposing a cylindrical member having an opening in part thereof in a vacuum chamber;

    a step of disposing a substrate inside the cylindrical member; a step of introducing a gas for carbon film production into the vacuum chamber; and a step of applying a voltage for plasma generation to the cylindrical member to thereby generate a plasma in the cylindrical member and to produce the carbon film on the surface of the substrate by the plasma.

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Patent Owner(s)

Patent OwnerAddress
PURERON JAPAN CO LTDIWAKI-SHI FUKUSHIMA 970-1144

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Haba, Masanori Machida, JP 18 85

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