Solar cell and process for producing the same

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United States of America Patent

PATENT NO 8802187
APP PUB NO 20100261308A1
SERIAL NO

12820892

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Abstract

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The present invention provides a method of manufacturing a solar cell, comprising forming a buffer layer comprising a group-III nitride semiconductor on a substrate using a sputtering method, and forming a group-III nitride semiconductor layer and electrodes on the buffer layer. The group-III nitride semiconductor layer is formed on the buffer layer by at least one selected from the group consisting of the sputtering method, a MOCVD method, an MBE method, a CBE method, and an MLE method, and the electrodes are formed on the group-III nitride semiconductor layer.

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Patent Owner(s)

Patent OwnerAddress
SHOWA DENKO K KTOKYO 105-8518

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hanawa, Kenzo Ichihara, JP 58 469
Ikenoue, Yoshiaki Yokohama, JP 21 228
Kaji, Hiroaki Chiba, JP 18 165
Konta, Ryoko Chiba, JP 4 31
Miki, Hisayuki Chiba, JP 71 866
Sasaki, Yasumasa Kamakura, JP 48 366
Yokouchi, Hitoshi Ichihara, JP 24 182

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