Method of manufacturing substrate for photovoltaic cell
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United States of America Patent
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Aug 5, 2014
Grant Date -
Oct 25, 2012
app pub date -
Apr 18, 2012
filing date -
Apr 22, 2011
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Abstract
A method of manufacturing a substrate for a photovoltaic cell, in which the high optical characteristic in a long-wavelength range available for the photovoltaic cell can be maintained, and at the same time, the amount of hazing can be increased. The method includes the step of forming a zinc oxide (ZnO) thin film layer doped with a dopant on a transparent substrate, and the step of controlling the surface structure of the zinc oxide thin film layer by etching the zinc oxide thin film layer using hydrogen plasma.
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