Method for the precise measuring operation of a micromechanical rotation rate sensor
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United States of America Patent
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Aug 5, 2014
Grant Date -
May 17, 2012
app pub date -
Apr 28, 2010
filing date -
Apr 30, 2009
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Abstract
A method and apparatus for the precise measuring operation of a micromechanical rotation rate sensor, including at least one deflectively suspended seismic mass, at least one drive device for driving the seismic mass, and at least one first and one second trimming electrode element, which are jointly assigned directly or indirectly to the seismic mass, a first electrical trimming voltage (UTO1, UTLO1, UTRO1) being set between the first trimming electrode element and the seismic mass, and a second electrical trimming voltage (UTO2, UTLO2, UTRO2) being set between the second trimming electrode element and the seismic mass, the first and the second electrical trimming voltages being set at least as a function of a quadrature parameter (UT) and a resonance parameter (Uf).
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