Light-emitting device with low forward voltage and method for fabricating the same

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United States of America Patent

PATENT NO 8785904
APP PUB NO 20120267655A1
SERIAL NO

13090899

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Abstract

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A light emitting device with reduced forward voltage Vf by utilizing the excellent lateral conduction of two-dimensional electron gas (2DEG) and two-dimensional hole gas (2DHG) structure and, more specifically, by improving the vertical conduction of 2DEG and 2DHG structure by means of vertical conductive passages formed in 2DEG and 2DHG structure. The conductive passages are formed via discontinuities in 2DEG and 2DHG structure. The discontinuities can be in the form of openings by etching 2DEG or 2DHG structure, or in the form of voids by growing 2DEG or 2DHG structure on a rough surface via epitaxy facet control. The discontinuities can be formed by vertical displacement of 2DEG structure. A method is provided for manufacturing a light emitting device with reduced forward voltage same.

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Patent Owner(s)

Patent OwnerAddress
ZHEJIANG INVENLUX TECHNOLOGY CO LTD314300 B7 EAST ROAD 01 DISTRICT HANGZHOU BAY BRIDGE HAIYAN ECONOMIC DEVELOPMENT ZONE HAIYAN CITY ZHEJIANG JIAXING JIAXING CITY ZHEJIANG PROVINCE 314300

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Wang, Hongmei El Monte, US 78 1211
Yan, Chunhui El Monte, US 17 162
Zhang, Jianping El Monte, US 226 928

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