High density refractory metals and alloys sputtering targets

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 8784729
APP PUB NO 20080171215A1
SERIAL NO

11653816

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

The present invention is directed to a process for producing high density, refractory metal products via a press/sintering process. The invention is also directed to a process for producing a sputtering target and to the sputtering target so produced.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
H C STARCK SOLUTIONS COLDWATER LLC460 JAY STREET COLDWATER MI 49036

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kumar, Prabhat Framingham, US 94 1335
Miller, Steven A Canton, US 86 1526
Rozak, Gary Akron, US 16 231
Wood, Charles Coldwater, US 31 291
Wu, Rong-Chein Richard Chelmsford, US 17 223
Zeman, Glen Coldwater, US 2 26

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
11.5 Year Payment $7400.00 $3700.00 $1850.00 Jan 22, 2026
Fee Large entity fee small entity fee micro entity fee
Surcharge - 11.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge after expiration - Late payment is unavoidable $700.00 $350.00 $175.00
Surcharge after expiration - Late payment is unintentional $1,640.00 $820.00 $410.00