Apparatus and method for generating extreme ultra violet radiation

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United States of America Patent

PATENT NO 8779403
APP PUB NO 20140166907A1
SERIAL NO

14103381

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Abstract

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An apparatus and a method for generating extreme ultra violet radiation are provided. The apparatus for generating extreme ultra violet radiation includes a light source, a first reflecting mirror on which source light emitted from the light source is incident, a second reflecting mirror on which first reflected light reflected by the first reflecting mirror is incident, a focus mirror on which second reflected light reflected by the second reflecting mirror is incident, the focus mirror reflecting third reflected light back to the second reflecting mirror, and a gas cell on which fourth reflected light reflected by the second reflecting mirror is incident.

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Patent Owner(s)

Patent OwnerAddress
FINE SEMITECH CORP#15-23 DONGTAN INDUSTRIAL COMPLEX 6-GIL DONGTAN-MYEON HWASEONG SI GYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Eok-Bong Hwaseong-si, KR 2 2
Kim, Seong-Sue Seoul, KR 47 154
Lee, Dong-Gun Hwaseong-si, KR 47 241
Park, Jong-Ju Hwaseong-si, KR 12 37

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